1. Tus qauv ntawm cov kua siv lead ua kua
Feem ntau, ib qho TFT-LCD yog tsim los ntawm ib qho kev sib sab laj substrate, ib sab substrate sib dhos, ua kua siv ua kua, ib chav tsav tsheb, ib lub teeb nrig, thiab lwm yam khoom siv. Qhov qis substrate sib dhos mas muaj xws li ib sab iav substrate thiab ib qho TFT array, thiab sab sauv substrate sib dhos muaj cov khaubncaws sab nraud povtseg. Cov iav substrate, lub thawv ntawv polarizing, thiab cov yeeb yaj duab qauv zais lub iav iav substrate uas ntim nrog cov kua siv lead ua nyob rau hauv qhov sib txawv tsim los ntawm qaum thiab sab substrates. Daim duab 1.1 qhia tau hais tias cov qauv ntawm cov xim TFT-LCD. Daim duab 1.2 qhia tau hais tias cov qauv ntawm lub teeb nrig thiab lub tsev tsav tsheb.
Sab hauv dej ntawm sab qab zog iav substrate them nrog ib cov yeeb yam iav micro-plates sib thooj rau pixel ntsiab lus ntawm cov zaub, TFT semiconductor switching pab kiag li lawm, thiab cov kab ntsig thiab txoj kab txuas nrog cov khoom siv hluav taws xob sib txuas. Cov no yog cov sau los ntawm microelectronics xws li photolithography thiab etching. Tus qauv ntu ntawm tus qauv TFT semiconductor nyob rau hauv uas txhua tus tsim pixel yog muaj nyob hauv daim duab. 1.3.
Nyob rau sab hauv iav ntawm lub iav iav substrate, pob tshab pleev cov iav yog siv, feem ntau yog siv los ntawm Indium Tin Oxide (ITO) cov khoom, uas ua hauj lwm ua ib qho hluav taws xob ntau thiab cov ntaub ntawv muaj ntau plhom tawm ntawm cov hluav taws xob cov pa hluav taws nyob rau sab hauv substrate. Series hluav taws xob. Raws li qhia hauv daim duab 1.4. Yog hais tias lub LCD yog xim, peb lub ntsiab xim (xim liab, xim ntsuab, xiav) cov xim thiab dub dots puv ntawm cov txheej txheem sib txuam thiab iav substrate, nyob rau hauv cov dub dots tiv thaiv lub teeb ntawm leaking ntawm qhov sib txawv ntawm cov pixels. , Nws yog tsim ntawm opaque cov ntaub ntawv, vim nws yog muab faib rau hauv ib lub matrix, nws yog hu ua dub matrix.
2 Txheej txheem LCD tsim
Lub xim TFT-LCD raug txheej txheem muaj plaub hom kev ua haujlwm: tus txheej txheem TFT, xim txheej txheem xim, txheej txheem ntawm tes, thiab txheej txheem ntawm tus txheej txheem. ] [2]. Xim TFT-LCD ua txheej txheem
2.1TFT txheej txheem
Lub luag hauj lwm ntawm TFT ua yog tsim TFTs thiab electrode arrays ntawm sab iav substrate. Rau daim TFT thiab electrode txheej txheem uas muaj nyob hauv daim duab 1.3, ib qho kev siv tsib daim npog ntsej muag feem ntau yog siv. Uas yog, tsib lub qhov ncauj qhov ntswg yog siv los ua kom tiav cov txheej txheem ntawm cov qauv hauv cov txheej txheem raws li tau qhia hauv Daim Ntawv Nplog 1.3 los ntawm 5 tib yam hloov cov txheej txheem [2]. Cov txiaj ntsim ntawm kev ua cov qauv kev hloov cov txheej txheem.
(a) Tsis tau 1 lub txheej txheem hloov mus rau lwm tus (b) Tsis tau. 2 kev hloov tus qauv (c) Tsis tau
(d) Tsis tau. 4 txoj kev pauv hloov (e) Tsis tau. 5 kev hloov cov txheej txheem
Kev soj ntsuam ntawm txhua txoj kev hloov cov txheej txheem
Cov qauv kev hloov khoom siv muaj cov khoom tso tawm, photolithography, khaus, ntxuav, thiab tshuaj ntsuam. Qhov kev nquag yog raws li nram no [1]:
Pib nrog iav substrate tshuaj ntsuam xyuas, zaj duab xis deposition, tu, thiab photoresist txheej.
Raug - kev loj hlob - kev sib tshuam - tshem tawm ntawm photoresist - tshuaj ntsuam
Txoj kev etching muaj xws li qhuav etching thiab ntub etching. Cov txheej txheem ntawm cov txheej txheem saum toj no ua zoo ib yam li cov txheej txheem sib xyaws ua siv hauv kev sib cog ua ke ntawm kev sib cog ua ke. Txawm li cas los xij, vim muaj thaj chaw loj ntawm iav substrate nyob rau hauv cov kua siv lead ua kua, cov txheej txheem tsis muaj thiab cov khoom siv tsis tau siv hauv lub tshuab TFT ua yog piav. Muaj ntau yam tshwj xeeb.
2.2 lim phaj ua tshuab
(a) iav substrate (b) lub teeb nris thaiv (c) lim ua
(d) Filter ua (e) Lim ua (f) ITO deposition
Daim duab 2.3 ntawm kev sib sau ua ke
Cov kev ua haujlwm ntawm cov phaj ua cov txheej txheem yog ua cov txheej txheem nyias zaj duab xis uas muaj nyob hauv daim duab 1.4 rau ntawm tus substrate. Txoj kev khiav yog raws li nram no:
Lub sijhawm pib ntawm blocker ua? ?? ua haujlwm lim ?? kev tiv thaiv thiab ntxuav ntawm qhov kev paub ntawm ITO tso quav?
Cov txheej txheem tseem ceeb los yog txheej txheem piav qhia saum toj no qhia txog cov nyhuv ua haujlwm.
Ib qho ntawm cov dots dub ua ntawm cov khoom siv opaque thiab muab faib rau hauv cov duab matrix yog teem rau lub lim substrate, thiab lawv tau ua tiav los ntawm cov qauv coj los hloov cov txheej txheem (tseem hu ua lub teeb nris blocker) thiab npaj rau lub lim. Thaum pib ntawm txoj kev photofabrication, txoj kev hloov cov qauv hauv qab no muaj xws li cov kauj ruam nram qab no: kev siv tshuaj tua kab, ntxuav, photoresist txheej, raug, kev txhim kho, ntub dej ntws, thiab tshem tawm photoresist, cov ntsiab cai ntawm txhua tus txheej txheem.
(a) Tso kua tshuaj (b) Tu (c) Photoresist txheej (d) Raug
(e) Tsim (f) Ntub Dej Ntws (g) Tshem tawm photoresist
Lub nris-thaiv txheej txheem hloov txheej txheem
Tom qab lub teeb nris tiav lawm, nws nkag mus hauv cov lim ua tiav. Peb hom kev lim dej (xim liab, ntsuab, thiab xiav) muaj feem xyuam los ntawm peb hom kev hloov, txij li peb hom kev lim dej tau ua ntawm cov xim txawv. Ua, qhov kev hloov cov txheej txheem txawv ntawm qhov kev hloov txheej txheem txawv, nws tsis suav cov txheej txheem ntawm etching thiab tshem photoresist. Cov txheej txheem tshwj xeeb yog: xim tawv tiv thaiv, raug, txhim kho thiab tshuaj ntsuam, thiab lub hauv paus ntsiab lus ntawm txhua txoj haujlwm.
Tom qab qhov chaw thaiv lub teeb ua tiav, tom qab ntxuav thiab tshawb xyuas cov txheej txheem, ITO cov txheej txheem tso tawm. Thaum kawg, ib txheej ntawm cov iav indium tin oxide (ITO) yog coated rau hauv cov lim txheej tsim ib qho hluav taws xob ntawm lub phaj lim. .
(a) Xim tawv tawv (b) Raug (c) Kev Txhim Kho (d) kev soj ntsuam
Xim lim qauv hloov txheej txheem
3 raug tsim cov txheej txheem ntawm kua siv lead ua kua
Kev tsim cov txheej txheem ntawm cov kua siv lead ua kua yog zoo li qhov ntawm qhov kev sib cog ua ke. Qhov txawv yog tias TFT txheej txheej hauv cov kua siv lead ua kua yog qhia tawm ntawm iav substrate es tsis txhob silicon wafer. Ntxiv rau, qhov kub thiab txias ntau npaum li cas los ntawm TFT ua tshuab 300 ~. 500oC, thaum cov khoom siv hluav taws xob ua ke yuav tsum tau muaj ntau qhov kub txog 1000 oC.
3.1 txheej txheem dej num
Muaj ob hom kev siv cov khoom siv ua kua siv ua kua dej ua kua tsim tau: ib qho ion-enhanced tshuaj yaj vapor deposition, thiab lwm qhov yog qhov dej khov. Lub hauv paus ntsiab lus ntawm ion-enhanced chemical vapor deposition yog tias cov iav substrate tso rau hauv lub tshuab nqus tsev vacuum thiab rhaub mus rau ib qho kub, thiab tom qab ntawd ces yuav muab cov roj to taub, thiab hluav taws xob RF siv rau lub chamber electrode, thiab qhov sib xyaw roj yog hloov mus rau hauv ib lub xeev ion. Yog li, ib cov yeeb yaj kiab los yog txheej ntawm cov hlau los yog compound tau tsim rau hauv substrate. Cov txheej txheem dej ntim ntawm txoj kev nqus dej yog qhov uas nyob hauv lub tshuab nqus tsev vacuum, lub hom phiaj yog bombarded nrog cov nqi zog, thiab lub koos pis tau txaus lub zog txaws rau hauv cov roj theem, thiab ces ib zaj duab xis ntawm cov khoom tib yam li lub hom phiaj yog tso rau saum npoo ntawm lub workpiece. Feem ntau, cov khoom nquag yog helium ions thiab argon ions kom tsis txhob hloov cov tshuaj ntawm lub hom phiaj. Txoj kev nqus dej ntws muaj feem xyuam nrog txoj kev siv cov pa tshuaj ntaus kis las, lub xov tooj cua ntau zaus, thiab qhov zoo li.
3.2 Lithography
Tus txheej txheem photolithography yog tus txheej txheem ntawm kev xa cov qauv ntawm ib daim npog rau ib qho iav substrate. Vim qhov zoo ntawm cov reticle ntawm lub vaj huam sib luag hauv LCD nyob ntawm qhov txheej txheem lithography, nws yog ib qho tseem ceeb tshaj plaws hauv cov txheej txheem LCD. Lub txheej txheem lithography txheej txheem yog ploj heev rau plua plav hauv cheebtsam, yog li nws yuav tsum tau ua nyob rau chav tsev kho kom huv.
3.3 txheej txheem etching
Txoj kev etching yog muab faib ua ib txoj kev etching ntub thiab txheej txheem qhuav etching. Cov txheej txheem ntub etching chemically tshem tawm cov khoom nyob rau ntawm lub substrate siv ib cov kua tshuaj reagent. Qhov zoo ntawm qhov ntawd yog luv luv, pheej yig, thiab khiav lag luam. Cov txheej txheem qhuav txheej txheem yog ib txoj hauv kev uas yog ib txoj kab yeeb nkab uas yog nyias muaj nyias ntawm cov ntshav. Raws li cov tshuaj tiv thaiv mechanism, cov ntshav dej ua ke, cov pob zeb ua haujlwm tsis thooj li, cov pob txha ua kom zoo dua qhov qub, thiab cov ntshav siab tseem yuav tau faib ua hom. Tsab ntawv tuaj yeem muab faib ua cylindrical, ib hom kab uas ntsiag to. Qhov zoo ntawm cov txheej txheem qhuav etching yog qhov qis qis dua, kev tswj siab, thiab kev ua zoo tsis zoo ntawm thaj tsam loj. ICP technology kuj tseem muaj qhov tsom iav nrog verticality zoo thiab suaj kaum. Yog li ntawd, qhuav etching yog siv los ua micrometers. Deep submicron, nano-scale geometry processing, muaj kev pom zoo.
4 Txoj kev loj hlob ntawm cov kua siv lead ua kua txheem tsim
4.1 TFT-LCD Kev Loj Hlob
Vim tias qhov loj ntawm lub iav substrate txiav txim siab qhov loj tshaj plaws ntawm LCD uas tuaj yeem ua tiav hauv cov kab thiab cov teeb meem ntawm kev ua lag luam, kev lag luam hauv LCD faib cov kab ntau ntxiv raws li qhov siab tshaj plaws ntawm iav substrate tias cov kab ntau lawm . Piv txwv, qib siab tshaj plaws ntawm kab 5th tiam. Qhov luaj li cas ntawm 1200 x 1300 hli. Nws tuaj yeem txiav mus txog 6 substrates rau 27-nti widescreen LCD-TV. Qhov luaj li cas ntawm lub cim lub cim thib xyoo yog 1500 X 1800 hli. Txiav 32-inch substrates tuaj yeem txiav 8 pieces thiab 37 nti tau txiav 6 pieces. Qhov loj ntawm qib 7 tiam yog 1800 X 2100 hli. Txiav 42 ntiv tes ntawm substrate tau txiav 8 pieces, 46 nti tau txiav 6 daim. Daim duab 4.1 qhia tau hais tias qhov txhais ntawm iav substrates rau lub 1 txog rau tiam thib 7. Tam sim no, lub ntiaj teb no tau nkag mus rau theem ntawm ntau lawm ntawm qib 6 thiab 7th khoom, thiab nws yuav tsum tau hais tias nyob rau hauv ob xyoos tom ntej, qhov nce ntawm cov muaj peev xwm ua ntej lub xyoo thib 5 thiab 5 yuav maj mam txo, thaum lub 6 thiab lub 7th tiam Lub zeem muag ntawm qib 7th yuav ua rau kev loj hlob ntawm ob lub xyoo dhau los. Tam sim no, cov cuab yeej loj cov khoom siv kuj tau ua cov khoom siv uas siv nrog rau tiam 6th lossis siab dua, xws li Nikon tus qauv theem siab ntawm cov qauv vaj huam sib luag rau cov ntawv teev npe 6, 7 thiab 8. FX-63S, FX-71S thiab FX-81S.
